Photonic Sintering Techniques for Nano Tubes

MR.KVG PRAVEEN, M NAVEEN PRASAD

Abstract


Photonic sintering is a low ADVANCED MANUFATURING SYSTEMS exposure sintering method developed to sinter nanoparticle thin films. The process involves using a xenon flash lamp to deliver a high intensity, short duration (< 1 ms), pulse of light to the deposited nanoparticles. Photonic sintering was developed by Nanotechnologies (now NovaCentrix) of Austin, Texas, and was first made public in 2006 (Schroder et al., 2006). As photonic sintering is a new technology it is also known as pulsed ADVANCED MANUFATURING SYSTEMS processing (PTP) (Camm et al., 2006) and intense pulsed light (IPL) sintering (Kim et al., 2009). Conductive thin films composed of nanoparticle depositions, when exposed to a short pulse of high intensity light, are transformed into functional printed circuits. 


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